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Samsung's initial system was 10LPE (10 reduced-electrical power Early) which was replaced by second technology evolved procedure 10LPP (10 Low-Power additionally). Samsung intends to introduce a third generational enhanced 10nm process named 8LPP (eight reduced Power additionally) that may more boost performance and introduce a little density boost through cell enhancements and also a narrower steel pitch.

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due to the fact not less than 1997, "method nodes" have already been named purely on a advertising and marketing basis, and possess no relation to the size to the integrated circuit;[one] neither gate length, metallic pitch or gate pitch on the "14nm" product is fourteen nanometers.

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resulting from internet marketing names, geometries differ enormously in between top makers. Even though each TSMC and Samsung's 10nm procedures are somewhat denser than Intel's 14nm in raw logic density, They can be significantly nearer to Intel's 14nm than They're to Intel's 10nm (e.g., Samsung's metal pitch just 1 nanometer shorter than Intel's 14nm).

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